Brooks-instrument GF81 Manuel d'utilisateur télécharger pdf (Page 10)

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Brooks

GF40/GF80/GF81 Devices

Installation and Operation Manual

X-TMF-GF40-GF80-Series-MFC-eng

Part Number: 541B161AAG

June, 2013

Section 1 Introduction

Term or Acronym Definition

CSR Customer Special Requirement.

CVD Chemical Vapor Deposition.

DSP Digital Signal Processor.

EPI Epitaxy (EPI). A process technology where a pure silicon

crystalline structure is deposited or “grown” on a

bare wafer, enabling a high-purity starting point

for building the semiconductor device.

HBD Horizontal Base Down.

HLD Horizontal Label Down.

HLU Horizontal Label Up.

HUD Horizontal Upside Down.

GF40/GF80 Series MultiFlo capable digital device.

GF81 Series High Flow Digital Device.

F.S. Full Scale.

LED Light Emitting Diode.

MFC Mass Flow Controller.

MultiFlo Configurator I/O communication software package that

configures gas and flow ranges.

MultiFlo Technology A physics-based calibration methodology that

enables gas and flow range configuration within

a defined standard configuration.

PID Proportional Integral Derivative Controller.

PSIA Pounds per Square Inch Absolute.

PSID Pounds per Square Inch Differential.

PSIG Pounds per Square Inch Gauge.

ROR As pressure increases, flow increases at a

pressure rate of rise, or ROR.

HC Standard Configuration w/ Hastelloy

sensors

(to reduce reaction to corrosive gases).

S.P. Setpoint.

Step Technology Enables fast set point control through a high

speed DSP.

VID Vertical mounting attitude with inlet side facing

down.

VIU Vertical mounting attitude with inlet side facing up.

Table 1-2 Terms and Acronyms

1 2 ... 5 6 7 8 9 10 11 12 13 14 15 ... 77 78

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Brooks-instrument GF81 Manuel d'utilisateur Page 10

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